China S.C Announces the Shipment of Mask Cleaning Equipment

Tronway Changzhou (referred to Tronway), a subsidiary of China S.C, has successfully delivered its self-developed mask cleaning equipment to many end-user fabs where the equipment has been verified and has entered mass production. The provided equipment can meet requirements for advanced process in terms of particle control, no water mark and surface cleanliness.

In the mask cleaning sector, Tronway has built a comprehensive product portfolio covering quartz masks in various sizes from 5" to 9". The systems support fully automated front-and-back-side cleaning, offer optional AOI particle inspection, and feature SMIF automated loading/unloading. Furthermore, the localization rate of critical components exceeds 80%, with fully proprietary software.

Mask Cleaning Equipment Series

1. CS + 150 MC Series (Spin Type / Bench + Spin Type)

The single-wafer cleaning equipment is specially designed for mask of 6025-type quartz glass, and is available in two configurations of Spin Type and Bench + Spin compound process.

· Suitable Substrate: 6025-type quartz glass

· Operation Mode: Single-wafer, supports Wet Dry In / Dry Out

· Process Chamber: Fork Hand Shower, UV, Rough, Edge, Surface×2, SPM, SC-1/Final and so on

· Supporting System: sub-devices of CSM /CDS , O₃-DIW, H₂-DIW, O₃ decomposer and so on

· Features: Multi-process integrated design. Bench+Spin type equipment supports both bench cleaning and spin cleaning

2. CS+150 Spin Type Mask Cleaning Tool

Compact single-wafer spin cleaning equipment, dimensions approx. 3,300 × 2,030 × 2,200 mm; SUS304 frame with powder-coated SPCC outer enclosure.

· Process Procedure: SMIF wafer pick-up → Buffer/Aligner → Flipper → UV → cleaning process chamber → back to SMIF

· Key Modules: Double Chambers, UV, Flipper, Buffer, Articulated Robot

· Features: Fully automated front- and back-side cleaning, closed-loop process control, and high-cleanliness robotic handling

3. S+200 Bench-Type Cleaning Equipment

· Loading and Unloading: 60XX features automated SMIF loading/unloading; 50XX/70XX/90XX use manual cassette loading; all with Dry-In/Dry-Out

· Operation Mode: Multi-wafer type, support Wet Dry In / Dry Out

· Process Bench: Benches of DHF, HCL, SC-1/Final Rinse and so on

· Supporting system: sub-devices of CSM /CDS and so on

· Drying Method: Marangoni dryer

· Features: Multi-process integrated design; Complying with SEMI standards and meeting the requirements of fully automated production

Core Technological Advantages

1. Whole-process automation: With self-developed software and over 80% domestic key components.

2. Comprehensive product portfolio: Single-wafer Spin-type tool, Bench+Spin type tool, Bench type tool, single-chamber/double-chamber configuration, multiple sizes available. Meeting production capacity and process requirements of different clients.

3. High integration of multiple processes: Flexible configuration of processes including UV, SPM, SC-1, Edge, Surface, Brush, Megasonic and so on.

4. Automation and cleanliness: Automatic loading and unloading of SMIF/OHT, articulated cleanroom robot and front- and back-side flipping and cleaning.

Tronway specializes in the R&D and manufacturing of wet chemical equipment for integrated circuits. Its product portfolio covers 6"–12" batch/single-wafer etching/cleaning systems, quartz mask substrate and mask cleaning equipment, as well as optical glass cleaning systems. Serving wafer manufacturing, third-generation semiconductors such as SiC and GaN, silicon-based power devices, mask manufacturing, and advanced packaging, the company delivers integrated “process + equipment + service” turnkey solutions.

Staying engineering-driven, Tronway will keep refining and expanding its mask cleaning product line — delivering high-performance, high-reliability wet chemical solutions to the semiconductor industry in China and worldwide, and helping China’s homegrown equipment achieve greater breakthroughs in high-end manufacturing.