Physical Vapor Deposition Equipment

  Features  

·Low temp. process with low bombardment to keep low resistance & hightransmittance; high temperature process ≥300 ℃. 

·Equipment series range from R&D equipment to mass production equipment.

·Vertical transfer & Horizontal transfer available.

·Applied in Perovskite, HJT, HBC in PV/Panel Display/IC/Lithium-ion Batteryindustries.