光注入退火炉

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光注入退火炉

调节电池片费米能级变化,控制H总量及价态,提高H钝化与缺陷修复效率,达到降低P型电池衰减效应,提高N型电池转换效率的效果。

设备名称 Equipment Name

光注入退火炉  Light Injection Annealing Furnace

设备型号 Equipment Model

SC-LED05L/RA


设备用途 Equipment Application

调节电池片费米能级变化,控制H总量及价态,提高H钝化与缺陷修复效率,达到降低P型电池衰减效应,提高N型电池转换效率的效果。

By adjusting the Fermi energy level of the cell, controlling the total amount and valence state of H,improving the efficiency of H passivation and defect repair, to reduce the LID effect of P-type cells and improve the conversion efficiency of N-type cells.


工艺流程  Process Flow

预热→光注入→冷却

Pre-heating →Light Injection →Cooling


技术特点  Features

1、双轨产线,机架电气完全独立,互不干扰。

Dual-track production line, the rack and electrical parts completely independent without interfering operations of each other.

2、大产能:匹配丝印工序产能,CT≤0.80秒,基于硅片尺寸M10(18X±0.5mm*18X±0.5mm)。
High throughput: match with the throughput of screen printing process, CT≤0.80s,based on silicon wafer size M10 (18X±0.5mm*18X±0.5mm). 


设备参数  Parameters