Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD

 Equipment Name

Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD

Equipment Model

PAR5500A

Equipment Application

In-line physical coating equipment for Transparent Conductive Oxide (TCO) coating on wafer,glass plate or flexible substrate.

Coating Principle

1、Magnetron Sputter (PVD).

2、Reactive Plasma Deposition (RPD).

Features

1、Multiple cathode operation for seed layer and multiple refractive index tandem TCO.

2、No bombardment on the substrate while keeping high mobility.

Parameters